Near-Amorphous Alloy Thin Films by Co-Sputtering Deposition


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Four alloy thin films were deposited on Si(100) by co-sputtering of various metals to investigate the formation of near-amorphous structure which may lead to featureless surface morphology and boundary-free structure. These thin films, Nb-Cr, Ta-Cr, Ti-Nb, and Zr-Cr, were examined using XRD SEM, and TEM. It is found that the forming ranges of near-amorphous thin films by co-sputtering are related to the difference in atomic size of the paired metals as well as their heat of mixing. Accordingly, Zr-Cr has the widest concentration range to form the near-amorphous structure. The addition of nitrogen during deposition can further enhance amorphization and reduce the surface roughness, until nitride phases are formed.


Edited by:

M. Gupta and Christina Y.H. Lim




J.H. Hsieh et al., "Near-Amorphous Alloy Thin Films by Co-Sputtering Deposition", Journal of Metastable and Nanocrystalline Materials, Vol. 23, pp. 211-214, 2005

Online since:

January 2005




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