Growth, Microstructure and Properties of Epitaxial La1-XSrxMnO3 Thin Films on Various Substrates Using RF Magnetron Sputtering

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Synthesis of high quality epitaxial LaMnO3 and (La,Sr)MnO3 films on large areas is highly desirable. Recently, we have deposited LaMnO3 and (La,Sr)MnO3 films on the MgO (001) and LaAlO3 (001) substrates using RF magnetron sputtering. Highly epitaxial quality thin films have been successfully obtained at 750 °C by manipulating processing parameters as characterized by X-ray diffraction, electron diffraction and HRTEM. The epitaxial LaMnO3 and (La,Sr)MnO3 thin films have either a tetragonal or orthorhombic crystal structure depending on the film (target) composition and substrate type. The (La,Sr)MnO3 films were found to have an orthorhombic crystal structure when deposited on LaAlO3 substrate and a tetragonal structure when deposited on MgO substrate; whereas LaMnO3 films have a tetragonal structure when deposited on LaAlO3 substrate and an orthorhombic crystal structure when deposited on MgO substrate. The orthorhombic structures of the (La,Sr)MnO3 film on LaAlO3 and LaMnO3 on MgO are oriented with their c-axis on the film plane. Magnetic studies show that the epitaxial films have higher phase transition temperature than the corresponding bulk material and to those obtained using pulse laser deposition. Successful synthesis of highly epitaxial quality films by RF magnetron sputtering over a larger area can result in reduced cost for fabricating and processing epitaxial thin films.

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Periodical:

Edited by:

Sergio Mejía

Pages:

83-92

DOI:

10.4028/www.scientific.net/JNanoR.14.83

Citation:

Y. Fang et al., "Growth, Microstructure and Properties of Epitaxial La1-XSrxMnO3 Thin Films on Various Substrates Using RF Magnetron Sputtering", Journal of Nano Research, Vol. 14, pp. 83-92, 2011

Online since:

April 2011

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$35.00

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