Chemical Mechanical Polishing (CMP) in Magnetic Float Polishing (MFP) of Advanced Ceramic (Silicon Nitride) and Glass (Silicon Dioxide)

Abstract:

Article Preview

Info:

Periodical:

Key Engineering Materials (Volumes 202-203)

Edited by:

Xipeng Xu, Jianyun Shen and Yuan Li

Pages:

1-14

DOI:

10.4028/www.scientific.net/KEM.202-203.1

Citation:

M. Jiang and R. Komanduri, "Chemical Mechanical Polishing (CMP) in Magnetic Float Polishing (MFP) of Advanced Ceramic (Silicon Nitride) and Glass (Silicon Dioxide)", Key Engineering Materials, Vols. 202-203, pp. 1-14, 2001

Online since:

June 2001

Export:

Price:

$35.00

In order to see related information, you need to Login.