Site-Defined Micropatterning Using Atomic Force Microscopic Lithography

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Site-defined metal microstructure was fabricated on the pre-designed organic template via a surface modification of Si(100) wafer. Site-defined substrate with octadecyltrichlorosilane (OTS) was oxidized by AFM (Atomic Force Microscopy) at threshold voltage (Vo). Terminal group (-CH3) of OTS was changed into carboxyl group (-COOH). Then, locally modified monolayer surface was used to induce the site-selective self-assembly of different materials (organic, metal, and semiconductor), according to the predefined patterns. The target metal selected is copper ions for the feasibility examination of conductive metal line fabrication

Info:

Periodical:

Key Engineering Materials (Volumes 277-279)

Edited by:

Kwang Hwa Chung, Yong Hyeon Shin, Sue-Nie Park, Hyun Sook Cho, Soon-Ae Yoo, Byung Joo Min, Hyo-Suk Lim and Kyung Hwa Yoo

Pages:

903-906

DOI:

10.4028/www.scientific.net/KEM.277-279.903

Citation:

I. H. Choi et al., "Site-Defined Micropatterning Using Atomic Force Microscopic Lithography", Key Engineering Materials, Vols. 277-279, pp. 903-906, 2005

Online since:

January 2005

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Price:

$35.00

[1] R. Maoz, S. R. Cohen and J. Sagiv, Adv. Mater., 11(1), 55-61 (1999).

[2] Y. Oh, J. Kim and H. Lee, J. Korean Phys. Soc., 35, 1013-1016 (1999).

[3] R. Maoz, E. Frydman, S. R. Cohen and J. Sagiv, Adv. Mater., 12(6), 424-429 (2000).

[4] Y. Wang and M. Lieberman, Langmuir, 19, 1159-1167 (2003).

[5] O. Azzaroni, P. L. Schilardi and R. C. Salvarezza, Electrochi. Acta, 48, 3107-3114 (2003).

[6] D. A. Styrkas, J. L. Keddie, J. R. Lu and T. J. Su, J. Appl. Phys., 85(2), 868-875 (1999).

[7] An introduction to ultrathin organic films from Langmuir-Blodgett to Self-Assembly, Ed., A. Ulman, Academic press, London, (1991).

[8] S. Liu, R. Maoz, G. Schmid and J. Sagiv, Nanoletters, 2(10), 1055-1060 (2002).

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