Site-Defined Micropatterning Using Atomic Force Microscopic Lithography


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Site-defined metal microstructure was fabricated on the pre-designed organic template via a surface modification of Si(100) wafer. Site-defined substrate with octadecyltrichlorosilane (OTS) was oxidized by AFM (Atomic Force Microscopy) at threshold voltage (Vo). Terminal group (-CH3) of OTS was changed into carboxyl group (-COOH). Then, locally modified monolayer surface was used to induce the site-selective self-assembly of different materials (organic, metal, and semiconductor), according to the predefined patterns. The target metal selected is copper ions for the feasibility examination of conductive metal line fabrication



Key Engineering Materials (Volumes 277-279)

Edited by:

Kwang Hwa Chung, Yong Hyeon Shin, Sue-Nie Park, Hyun Sook Cho, Soon-Ae Yoo, Byung Joo Min, Hyo-Suk Lim and Kyung Hwa Yoo






I. H. Choi et al., "Site-Defined Micropatterning Using Atomic Force Microscopic Lithography", Key Engineering Materials, Vols. 277-279, pp. 903-906, 2005

Online since:

January 2005




[1] R. Maoz, S. R. Cohen and J. Sagiv, Adv. Mater., 11(1), 55-61 (1999).

[2] Y. Oh, J. Kim and H. Lee, J. Korean Phys. Soc., 35, 1013-1016 (1999).

[3] R. Maoz, E. Frydman, S. R. Cohen and J. Sagiv, Adv. Mater., 12(6), 424-429 (2000).

[4] Y. Wang and M. Lieberman, Langmuir, 19, 1159-1167 (2003).

[5] O. Azzaroni, P. L. Schilardi and R. C. Salvarezza, Electrochi. Acta, 48, 3107-3114 (2003).

[6] D. A. Styrkas, J. L. Keddie, J. R. Lu and T. J. Su, J. Appl. Phys., 85(2), 868-875 (1999).

[7] An introduction to ultrathin organic films from Langmuir-Blodgett to Self-Assembly, Ed., A. Ulman, Academic press, London, (1991).

[8] S. Liu, R. Maoz, G. Schmid and J. Sagiv, Nanoletters, 2(10), 1055-1060 (2002).

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