SiC Coatings Deposited by RF Magnetron Sputtering


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Amorphous SiC coatings were deposited by RF magnetron sputtering from a sintered SiC target onto Si(100) substrate at room temperature. The influence of RF power on the surface morphology and the RMS surface roughness of the resulting SiC coatings was studied by using atomic force microscopy. Two types of surface morphologies were obtained. The corresponding forming mechanisms were also discussed.



Key Engineering Materials (Volumes 280-283)

Edited by:

Wei Pan, Jianghong Gong, Chang-Chun Ge and Jing-Feng Li




H. D. Tang et al., "SiC Coatings Deposited by RF Magnetron Sputtering", Key Engineering Materials, Vols. 280-283, pp. 1309-1312, 2005

Online since:

February 2007




[1] M. Cremona, L.M. Gazola, L.C. Scavarda do Carmo, J.T.P. Castro and C.A. Achete: Thin Solid Films Vol. 377-378 (2000), p.436.


[2] C.R. Stoldt, C. Carraro, W.R. Ashurst, D. Gao, R.T. Howe and R. Maboudian: Sens. Actuators A Vol. 97-98 (2002), p.410.

[3] P. Antoine and M. Fruit: SPIE Vol. 3737 (1999), p.418.

[4] M.S. Aida and M. Ghrieb: Mater. Chem. Phys. Vol. 47 (1997), p.97.

[5] K. Wasa, T. Nagai and S. Hayakawa: Thin Solid Films Vol. 31 (1976), p.235.