Optimization of the Chemical Vapor Deposition Induced Focused Ion Beam

Abstract:

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This paper carried out some experimentation and verification of the chemical vapor deposition induced ion beam and sputtering using the SMI8800 manufactured by SEIKO. FIB-CVD is very useful tools to repair the mask or IC with sub-micrometer precision. However it need to be much studied in some fields such as FIB-CVD mechanism and the characteristics of pattern accuracy and yield of CVD according to many parameters related to ion beam, beam scanning methods and type of specimen etc. Therefore the verification on FIB-CVD characteristic such as accuracy and yield according to scanning area and scanning time is carried out in this study. And it suggests the optimization parameters, various mechanisms of the chemical vapor deposition induced ion beam and sputtering effect for simple pattern.

Info:

Periodical:

Key Engineering Materials (Volumes 291-292)

Edited by:

Yury M. Baron, Jun'ichi Tamaki and Tsunemoto Kuriyagawa

Pages:

413-418

DOI:

10.4028/www.scientific.net/KEM.291-292.413

Citation:

H. J. Choi et al., "Optimization of the Chemical Vapor Deposition Induced Focused Ion Beam", Key Engineering Materials, Vols. 291-292, pp. 413-418, 2005

Online since:

August 2005

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Price:

$35.00

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