The Mechanical Property of TiN Film Deposited on N+-Implanted Aluminum by Magnetron Sputtering

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The effect of a AlN gradient interlayer on the surface mechanical properties was investigated by nano-indentation for the TiN film on N+-implanted Al substrate. The AlN interlayer, 80nm thick measured by Auger Electron Spectrometer (AES), was formed by high energy N+-implantation prior to magnetron sputtering the TiN film in our custom designed multifunctional ion implanter. The nanohardness of N+-implanted aluminum was 450HV at extremely small depth, but quickly decreased to a constant value (65HV). The hardness and Young’s modulus of the TiN film on two different substrates, one with and the other without N+-implantation, kept almost constant up to a small depth of 200nm, and then decreased to the values of the Al substrate with increasing indentation depth, but with a lower decreasing rate for the N+-implanted system. It was found from the load-displacement curves that the interfaces cracked when the indentation load was 38mN for the N+-implanted system, while 18mN for the unimplanted system. Therefore the N+- implantation improved the surface mechanical properties significantly.

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Periodical:

Key Engineering Materials (Volumes 297-300)

Edited by:

Young-Jin Kim, Dong-Ho Bae and Yun-Jae Kim

Pages:

1713-1717

Citation:

X. Cai et al., "The Mechanical Property of TiN Film Deposited on N+-Implanted Aluminum by Magnetron Sputtering", Key Engineering Materials, Vols. 297-300, pp. 1713-1717, 2005

Online since:

November 2005

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$41.00

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DOI: https://doi.org/10.1016/s0040-6090(00)01927-1

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