Apatite Pattern Formation by Electrophoretic Deposition Transcribing Resist Pattern
Apatite pattern was prepared by electrophoretic deposition (EPD) transcribing resist pattern. A porous polytetrafluoroethylene (PTFE) film was used as a substrate and attached on a cathode. The cathode for EPD was stainless plate with resist pattern. EPD was performed with a suspension of wollastonite particles in acetone and wollastonite particles were deposited on the substrate in the form of the resist pattern. When the wollastonite-deposited substrate was soaked in simulated body fluid (SBF), apatite was induced and then replaced wollastonite at the wollastonite deposited region on the substrate. As a result, apatite was formed in the pattern that traced the resist pattern. The minimum line width of the apatite pattern was about 100 µm.
Takashi Nakamura, Kimihiro Yamashita and Masashi Neo
S. Yamaguchi et al., "Apatite Pattern Formation by Electrophoretic Deposition Transcribing Resist Pattern ", Key Engineering Materials, Vols. 309-311, pp. 659-662, 2006