Apatite Pattern Formation by Electrophoretic Deposition Transcribing Resist Pattern


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Apatite pattern was prepared by electrophoretic deposition (EPD) transcribing resist pattern. A porous polytetrafluoroethylene (PTFE) film was used as a substrate and attached on a cathode. The cathode for EPD was stainless plate with resist pattern. EPD was performed with a suspension of wollastonite particles in acetone and wollastonite particles were deposited on the substrate in the form of the resist pattern. When the wollastonite-deposited substrate was soaked in simulated body fluid (SBF), apatite was induced and then replaced wollastonite at the wollastonite deposited region on the substrate. As a result, apatite was formed in the pattern that traced the resist pattern. The minimum line width of the apatite pattern was about 100 µm.



Key Engineering Materials (Volumes 309-311)

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Edited by:

Takashi Nakamura, Kimihiro Yamashita and Masashi Neo




S. Yamaguchi et al., "Apatite Pattern Formation by Electrophoretic Deposition Transcribing Resist Pattern ", Key Engineering Materials, Vols. 309-311, pp. 659-662, 2006

Online since:

May 2006




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