AFM for Preparing Si Masters in Soft Lithography


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Atom Force Microscopy (AFM) can be employed to create surfaces in Si substrate with recessed features. The resulting patterns can serve as masters to make the required elastomeric stamps for soft lithography. Morphology analysis of patterned features on Si substrate and polydimethylsiloxane (PDMS) stamp by AFM imaging confirms that pattern can be successfully transferred from Si substrates to PDMS stamps. It is shown that this method for creating masters can be performed with an AFM, making this method particularly straightforward, economical and accessible to a large technical community that are provided with AFM for measurement.



Key Engineering Materials (Volumes 315-316)

Edited by:

Zhejun Yuan, Xipeng Xu, Dunwen Zuo, Julong Yuan and Yingxue Yao




X. L. Zhao et al., "AFM for Preparing Si Masters in Soft Lithography", Key Engineering Materials, Vols. 315-316, pp. 762-765, 2006

Online since:

July 2006




[1] Y.N. Xia and G.M. Whitesides: Angew. Chem. Int. Ed., Vol. 37 (1998), p.550.

[2] L.W. Zlich, G.A. Husseini Y.Y. Lua and et al: Rev. Sci. Instru., Vol. 75 (2004), p.3065.

[3] N. L. Abbott, A. Kumar and G. M. Whitesides: Chem. Mater, Vol. 6 (1994), p.596.

[4] D. Qin, Y. Xia and G.M. Whitesides: Adv. Mater., Vol. 8 (1996), p.917.

[5] B.A. Grzybowski, R. Haag, N. Bowden and et al: Anal. Chem., Vol. 70 (1998), p.4645.

[6] R.D. Piner, J. Zhu and et al: Science, Vol. 283 (1999), p.661.

[7] K. Wilder, C.F. Quate and et al: Appl. Phys. Lett., Vol. 73 (1998), p.2527.

[8] S. Xu and G.Y. Liu: Langmuir, Vol. 13 (1997), p.127.

[9] H. Sugihara, A. Takahara and T. Kajiyama: J. Val. Sci. Technol B, Vol. 19 (2001), p.593.

[10] J.M. Lee, W.H. Jin and D.E. Kim: Wear, Vol. 251 (2001), p.1133.

[11] T. Sun, Y.D. Yan, J.F. Xia and et al: Key Engineering Materials, Vol. 259-2, pp.577-581.