Synthesis of Oxide Thin Films on Silicon Substrate Using Supercritical Carbon Dioxide Fluid

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Thin films of titanium oxide (TiO2) were synthesized from Titanium diisopropoxide bis(dipivaloylmethanate) [Ti(O-i-Pr)2(dpm)2] as a source material using supercritical carbon dioxide (CO2) fluid. Flat films with a uniform microstructure were fabricated on SiO2/(100)Si substrates at a fluid pressure of 8.0 MPa, while granular particles were deposited on the film surface at a fluid pressure of 10.0 MPa. TiO2 films fabricated in supercritical CO2 atmosphere at 10.0 MPa were crystalline at the reaction temperature of 100°C, which was significantly lower than those in the conventional film-deposition techniques.

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Periodical:

Edited by:

Keiichi Katayama, Kazumi Kato, Tadashi Takenaka, Masasuke Takata and Kazuo Shinozaki

Pages:

91-94

DOI:

10.4028/www.scientific.net/KEM.320.91

Citation:

F. Kano et al., "Synthesis of Oxide Thin Films on Silicon Substrate Using Supercritical Carbon Dioxide Fluid", Key Engineering Materials, Vol. 320, pp. 91-94, 2006

Online since:

September 2006

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$35.00

[1] Y. Arai, T. Sako and Y. Takebayashi, Supercritical Fluids, (Springer, Berlin, 2002), p.358.

[2] J. M. Blackburn, D. P. Long, A. Cabanas and J. J. Watkins, Science, 294 (2001), p.141.

[3] E. Kondoh and H. Kato, Microelectr. Eng. 64 (2002), p.495.

[4] H. Uchida, A. Otsubo, K. Itatani and S. Koda, Jpn. J. Appl. Phys., 44 (2005), p. (1901).

[5] R. Span and W. Wagner, J. Phys. Chem. Ref. Data, 25, (1996), p.1509.

[6] K. Sue, Y. Haruta, R. L. Smith, T. Adschiri and K. Arai, J. Chem. Eng. Data, 44 (1999), p.1422. e-mail : uchidah@sophia. ac. jp.

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