Effect of SiO2 Cap Layer on Thermal Stability of Nickel and Nickel-Cobalt Silicide

Abstract:

Article Preview

We investigated the effect of SiOcap layer on the thermal stability of nickel and nickel-cobalt silicide by measuring its sheet resistance. The stability of nickel silicide was deteriorated as a function of annealing temperature, while that of nickel-cobalt silicide was not. In case of both silicides, the SiOcap layer improved the stability. Tensile stress from the difference of thermal expansion coefficients between SiO2 and nickel silicide may suppress the agglomeration of nickel silicide.

Info:

Periodical:

Key Engineering Materials (Volumes 321-323)

Edited by:

Seung-Seok Lee, Joon Hyun Lee, Ik Keun Park, Sung-Jin Song, Man Yong Choi

Pages:

1322-1325

DOI:

10.4028/www.scientific.net/KEM.321-323.1322

Citation:

K. J. Han et al., "Effect of SiO2 Cap Layer on Thermal Stability of Nickel and Nickel-Cobalt Silicide", Key Engineering Materials, Vols. 321-323, pp. 1322-1325, 2006

Online since:

October 2006

Export:

Price:

$35.00

[1] S. P. Muraka D. B. Fraser: J. Appl. Phys. Vol. 51 (1980), p.342.

[2] K. Maex: Appl. Surf. Sci. Vol. 53 (1991), p.328.

[3] C. J. Choi, Y. W. OK, T. Y. Seong and H. D. Lee: Jpn J. Appl. Phys. Pt. Vol. 141 (2002).

[4] J. S. Maa, D. J. Tweet, Y. Ono, L. Stecker and S. T. Hsu: Mater. Res. Symp. Proc. Vol. 670 (2001), p.691.

[5] C. -J. Choi, Y. -W. Ok, T. -Y. Seong, and H. -D. Lee: J. Appl. Phys., Vol. 41 (2002), p. (1969).

[6] C. Detavernier, Co. Lavoie, and F. M. d'Heurle: J. Appl. Phys, Vol. 93 (2003), p.2510.

[7] S. Wolf and R.N. Tauber: Silicon Processing for the VLSI Era: Volume 1 - Process Technology (Lattice Press, CA 1986).

[8] H. Kahn, M.A. Huff, and A.H. Heuer: Mat. Res. Soc. Symp. Proc., Vol 518 (1998), p.33.

In order to see related information, you need to Login.