Effect of SiO2 Cap Layer on Thermal Stability of Nickel and Nickel-Cobalt Silicide
We investigated the effect of SiOcap layer on the thermal stability of nickel and nickel-cobalt silicide by measuring its sheet resistance. The stability of nickel silicide was deteriorated as a function of annealing temperature, while that of nickel-cobalt silicide was not. In case of both silicides, the SiOcap layer improved the stability. Tensile stress from the difference of thermal expansion coefficients between SiO2 and nickel silicide may suppress the agglomeration of nickel silicide.
Seung-Seok Lee, Joon Hyun Lee, Ik Keun Park, Sung-Jin Song, Man Yong Choi
K. J. Han et al., "Effect of SiO2 Cap Layer on Thermal Stability of Nickel and Nickel-Cobalt Silicide", Key Engineering Materials, Vols. 321-323, pp. 1322-1325, 2006