Development of In-Situ SUB-100nm Particle Detection in Vacuum System


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A feasibility test for real-time fine particle measurements in vacuum semiconductor processing equipment has been conducted. The approach in monitoring particles in process equipment is an installation of a sensor at a critical location inside the process equipment (hence the term ‘in-situ’) to track free particle levels in real-time. Common method for particle detection in a process chamber today is a use of test wafer with a laser wafer scanner. However, this method does not give a real time information of the particle status in the process chamber. In this paper, a new method has been developed to detect particles in real time in vacuum system for particles smaller than an optical method can detect. The system consists of a particle charging region and a particle detection region in a vacuum system. Particles with 50nm are successfully detected at about 10 torr region.



Key Engineering Materials (Volumes 321-323)

Edited by:

Seung-Seok Lee, Joon Hyun Lee, Ik Keun Park, Sung-Jin Song, Man Yong Choi




K. H. Ahn and Y. M. Kim, "Development of In-Situ SUB-100nm Particle Detection in Vacuum System", Key Engineering Materials, Vols. 321-323, pp. 1707-1710, 2006

Online since:

October 2006




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