The electron moiré method uses a high frequency grating to measure microscopic deformation. Finer and finer gratings are being pursued to meet higher and higher resolution requirements in microscopic stress analysis. In this study, the techniques of fabricating electron grid by means of a scanning electron microscope are improved. The use of a low accelerating voltage shows a better effect than the high accelerating voltage in fabricating a superfine grid. A new group of parameters is suggested based on this consideration. A cross-line grid with a frequency of 10,000 lines/mm and a parallel grating with a frequency of 13,000 lines /mm have been successfully fabricated.