Fabrication of Superfine Electron Moiré Grid

Abstract:

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The electron moiré method uses a high frequency grating to measure microscopic deformation. Finer and finer gratings are being pursued to meet higher and higher resolution requirements in microscopic stress analysis. In this study, the techniques of fabricating electron grid by means of a scanning electron microscope are improved. The use of a low accelerating voltage shows a better effect than the high accelerating voltage in fabricating a superfine grid. A new group of parameters is suggested based on this consideration. A cross-line grid with a frequency of 10,000 lines/mm and a parallel grating with a frequency of 13,000 lines /mm have been successfully fabricated.

Info:

Periodical:

Key Engineering Materials (Volumes 326-328)

Edited by:

Soon-Bok Lee and Yun-Jae Kim

Pages:

111-114

DOI:

10.4028/www.scientific.net/KEM.326-328.111

Citation:

Y. M. Xing, S. Kishimoto, "Fabrication of Superfine Electron Moiré Grid", Key Engineering Materials, Vols. 326-328, pp. 111-114, 2006

Online since:

December 2006

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Price:

$35.00

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