Design of a Rubber Membrane under Substrate for Nanoimprint Lithography Process

Abstract:

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Nanoimprint lithography is a promising technology to produce sub-100 nm scale features on silicon chips. One of key issues in the nanoimprint lithography is how to make uniform contact between the stamp and the substrate on a large area. In this study a rubber membrane unit under substrate is introduced to resolve this problem. Two layers of membrane were designed to consider air flow in the middle of resist on a silicon wafer. The geometry design for accomplishing uniform contact was carried out using finite element analysis. The material modeling of hyperelastic properties of rubber is characterized by the Mooney-Rivlin strain energy functions. Material constants in the strain energy functions are able to be determined via the curve fitting of experimental stress-strain data. Simple tension and equi-biaxial tests were performed to determine the material constants. To evaluate the effects of a rubber membrane unit, nanoimprint lithography process with it was executed. We could confirm that a distinct improvement of uniform contact was shown and air flow problem was solved during the process.

Info:

Periodical:

Key Engineering Materials (Volumes 326-328)

Edited by:

Soon-Bok Lee and Yun-Jae Kim

Pages:

345-348

DOI:

10.4028/www.scientific.net/KEM.326-328.345

Citation:

S. W. Han et al., "Design of a Rubber Membrane under Substrate for Nanoimprint Lithography Process", Key Engineering Materials, Vols. 326-328, pp. 345-348, 2006

Online since:

December 2006

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Price:

$38.00

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[4] J.J. Lee, K.B. Choi and G.H. Kim: Current Applied Physics (2006).

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