Investigation of Thermo-Chemical Polishing of CVD Diamond Film
ZnO/Diamond structure has attracted a lot of attentions and heavy investment recently just because diamond has the capability of producing very high surface acoustic wave (around 10,000m/s). In this present study, the microwave chemical vapor deposition (CVD) method was employed to produce diamond films on silicon single crystal. Thermo-chemical polishing experiments were then conducted on the obtained diamond films. The underlying material removal mechanisms, microstructure of the machined surface and related machining conditions were also investigated. Thermo-chemical polishing was proved to be able to remove the diamond film very effectively (4.8μm deep of diamond film was removed in 30 minutes when polishing at 550oC and 5.7m/s). The material removal rate was increased with polishing speed and pressure. Higher polishing temperature would improve the chemical reaction and result in better surface finish.
Dongming Guo, Tsunemoto Kuriyagawa, Jun Wang and Jun’ichi Tamaki
W. C. Chou et al., "Investigation of Thermo-Chemical Polishing of CVD Diamond Film", Key Engineering Materials, Vol. 329, pp. 195-200, 2007