Preparation of Titania Films on Implant Titanium by Electron Cyclotron Resonance Plasma Oxidation

Abstract:

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Titania (TiO2) thin films were fabricated on titanium (Ti) substrates at low temperatures by electron cyclotron resonance (ECR) plasma oxidation, and the relationship among the oxidization conditions, crystal structure and osteoconductive property was investigated. Amorphous TiO2 films were obtained below 300°C and crystallized rutile-type TiO2 films were obtained above 400°C. The XRD peak intensity of rutile TiO2 increased with increasing oxidation temperature. Mixtures of octacalcium phosphate (OCP) and Dicalcium phosphate dihydrate (DCPD) peaks were observed after calcification. The intensity of the OCP and DCPD peaks after calcification increased with increasing oxidation temperature. The ECR plasma was significantly effective to prepare crystallized TiO2 films at low temperatures.

Info:

Periodical:

Key Engineering Materials (Volumes 330-332)

Main Theme:

Edited by:

Xingdong Zhang, Xudong Li, Hongsong Fan, Xuanyong Liu

Pages:

565-568

DOI:

10.4028/www.scientific.net/KEM.330-332.565

Citation:

H. Masumoto et al., "Preparation of Titania Films on Implant Titanium by Electron Cyclotron Resonance Plasma Oxidation", Key Engineering Materials, Vols. 330-332, pp. 565-568, 2007

Online since:

February 2007

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Price:

$35.00

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