Hydroxyapatite Films Deposited on TiN and TiO2 Buffer Layers by Radio-Frequency Magnetron Sputtering: Comparative Study

Abstract:

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A comparative study was presented to demonstrate the clear influence of the different buffer layer (TiN and TiO2) on the HA film. In this study, magnetron sputtering was applied for different film deposition. Nano-indentation was used to examine the mechanical properties of the HA film on both TiN and TiO2 buffer layers. It is found that HA film on TiN buffer layer is harder and the HA film on TiO2 buffers is more rigid. Further more, the simulated body fluid (SBF) soaking test was selected to investigate the properties of the HA/TiN and HA/TiO2 films in the physiological media. The obvious delamination was observed on the surface of HA film on TiN buffer layer, while the surface morphology of HA film on TiO2 buffer layer remained nearly unchanged. The result indicated that TiO2 buffer layer shows a better interfacial bonding to the HA film.

Info:

Periodical:

Key Engineering Materials (Volumes 334-335)

Edited by:

J.K. Kim, D.Z. Wo, L.M. Zhou, H.T. Huang, K.T. Lau and M. Wang

Pages:

1133-1136

DOI:

10.4028/www.scientific.net/KEM.334-335.1133

Citation:

X. C. Wu et al., "Hydroxyapatite Films Deposited on TiN and TiO2 Buffer Layers by Radio-Frequency Magnetron Sputtering: Comparative Study", Key Engineering Materials, Vols. 334-335, pp. 1133-1136, 2007

Online since:

March 2007

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$35.00

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