Study on the Properties of Alumina Ceramics after Implanted by Titanium Ions with MEVVA Sources

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HIP (hot isostatic pressed) high-purity alumina was modified by Ti-ion implantation in a MEVVA (Metal Vapor Vacuum Arc) implanter. The samples were implanted by Ti ions with nominal doses 5×1016 to 1×1018 ions/cm2 under ambient temperature. The effects of titanium implantation and the ion dose implanted on the microstructures and mechanical properties of the ceramics were studied. After implanted by Ti ions, the maximum nanohardness of the as-implanted ceramics were increased about 20%; the bending strength were increased about 22%; the life of the alumina cutting tools were about 2 times longer than before. The result showed that all the factors of the improvement of the ceramic surface states played an important role on the mechanical properties after implantation.

Info:

Periodical:

Key Engineering Materials (Volumes 336-338)

Edited by:

Wei Pan and Jianghong Gong

Pages:

1211-1213

DOI:

10.4028/www.scientific.net/KEM.336-338.1211

Citation:

F. Shi et al., "Study on the Properties of Alumina Ceramics after Implanted by Titanium Ions with MEVVA Sources", Key Engineering Materials, Vols. 336-338, pp. 1211-1213, 2007

Online since:

April 2007

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Price:

$35.00

[1] L. Boudoukha, S. Paletto, et al.: Nucl. Instr. Meth. Vol. B122 (1997), p.233.

[2] S.M.M. Ramos, B. Canut, et al.: J. Mater. Res. Vol. 7 (1992), p.178.

[3] I.L. Singer: Surf. Coat. Tech. Vol. 33 (1987), p.487.

[4] A. Gouldstone, K.J.V. Vliet, S. Suresh: Nature Vol. 411 (2001), p.656.

[5] S. Suresh: Science Vol. 292 (2001), p.2447.

[6] S. Suresh, T. -G. Nieh and B.W. Choi: Scr. Mater. Vol. 41 (1999), p.951.

[7] L. Boudoukha, F. Halitim, et al.: Ceram. Inter. Vol. 24 (1998), p.189.

[8] H. Ji, P.J. Evans and M. Samandi: J. Mater. Sci. Vol. 35 (2000), p.3681. Fig. 4 Flank wears and wear curves of alumina ceramic tools as a function of the dose implanted by titanium.

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