Fabrication of SiCN MEMS by UV Lithography of Polysilazane

Abstract:

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A novel process with low cost to fabricate SiCN MEMS based on UV lithographic technique is present in this paper. The prepared MEMS are very promising to be used in high-temperature environments. By adding a photo initiator to the polysilazane precursor, the precursor becomes UV-sensitive and can be solidified upon exposure to UV light, which leads to the formation of UV photo lithographical patterns. Key issues of the fabrication process are investigated and various SiCN MEMS structures are fabricated by this technique.

Info:

Periodical:

Key Engineering Materials (Volumes 336-338)

Edited by:

Wei Pan and Jianghong Gong

Pages:

1477-1480

DOI:

10.4028/www.scientific.net/KEM.336-338.1477

Citation:

H. T. Wang et al., "Fabrication of SiCN MEMS by UV Lithography of Polysilazane", Key Engineering Materials, Vols. 336-338, pp. 1477-1480, 2007

Online since:

April 2007

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Price:

$35.00

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