Growth of TiO2 Thin Film on Glass Substrate by Air-Opened MOCVD

Abstract:

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MOCVD was applied to deposit TiO2 thin films on glass substrates. Effects of the deposition conditions (source temperature and substrate temperature) were studied. The phase and micro- structure of the TiO2 thin films were examined by X-ray diffraction and electron microscopy, respectively. The results indicate that substrate temperature affects both the morphology and the phase of the TiO2 film, while source temperature only affects the surface morphology of TiO2 film. Highly oriented anatase film on glass substrate was obtained at a source temperature of 140 oC and a substrate temperature of 350 oC. XRD pattern shows that only the (200) peak of anatase appears under the conditions. The crystallines in the highly oriented anatase were rectangular in top view.

Info:

Periodical:

Key Engineering Materials (Volumes 336-338)

Edited by:

Wei Pan and Jianghong Gong

Pages:

1976-1978

DOI:

10.4028/www.scientific.net/KEM.336-338.1976

Citation:

L. N. Li, J. H. Gu, Y. Zhang, "Growth of TiO2 Thin Film on Glass Substrate by Air-Opened MOCVD", Key Engineering Materials, Vols. 336-338, pp. 1976-1978, 2007

Online since:

April 2007

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$35.00

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