Microstructure and Dielectric Properties of LiTiNiO Thin Films

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LiTiNiO thin films were deposited on Pt/Ti/SiO2/Si(100) substrates using a sol-gel spin-coat method. The effects of annealing temperature and annealing time on microstructures and dielectric properties of the thin films were investigated. SEM images showed the thin films had uniform and dense microstructure and the grain size increased with increasing temperature and time. The LiTiNiO thin films consisted of complex oxides which proportions were mainly dependent on the annealing condition. The LiTiNiO thin film annealed at 600°C for 1h showed the highest dielectric constant and frequency stability, while prolonging annealing time even at 600°C resulted in the decrease in the frequency stability of the dielectric constants.

Info:

Periodical:

Key Engineering Materials (Volumes 336-338)

Edited by:

Wei Pan and Jianghong Gong

Pages:

2635-2638

DOI:

10.4028/www.scientific.net/KEM.336-338.2635

Citation:

Y. Dong et al., "Microstructure and Dielectric Properties of LiTiNiO Thin Films", Key Engineering Materials, Vols. 336-338, pp. 2635-2638, 2007

Online since:

April 2007

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Price:

$38.00

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