MD Analysis on Tip Geometry Effects in AFM-Based Lithography Process


Article Preview

A three dimensional molecular dynamics model is employed to simulate AFM-based lithography process. To investigate effects of tip geometry, three kinds of tip models are proposed: a cone-shape tip with a hemisphere at the end, a round-edged three sided pyramid tip with a hemisphere at the end and a sharp-edged three sided pyramid tip. These models simulate scratching behaviors of AFM tip at different scratching depths. Results showed that materials removal behavior and scratching forces were significantly affected by tip geometry, depending on the scratching depth and scratching directions. The specific energy using a sharp-edged three sided pyramid tip displayed a different behavior comparing to that using a round-edged three sided pyramid. However, scratching orientations exhibited no effects on the specific energy.



Edited by:

Shen Dong and Yingxue Yao




Y. D. Yan et al., "MD Analysis on Tip Geometry Effects in AFM-Based Lithography Process", Key Engineering Materials, Vol. 339, pp. 228-233, 2007

Online since:

May 2007




[1] T. Sumomogi, T. Endo and K. Kuwahara: J. Vac. Sci. Technol., Vol. 12 (1994) No. 3, pp.1876-1880.

[2] H.W. Schumacher, U.F. Keyser, U. Zeitler and et al: Physics E, Vol. 6 (2000), pp.860-863.

[3] T. Sun, Y.D. Yan, J.F. Xia and et al: Key Engineering Materials, Vol. 259-260 (2004), pp.577-581.

[4] T.H. Fang and C.I. Weng: Nanotechnology, Vol. 11 (2000), pp.148-153.

[5] T.H. Fang, C.I. Weng and J.G. Chang: Surface Science, Vol. 501 (2002), pp.138-147.

[6] Y.S. Kim, S.H. Yang, Kim C. I. and et al: Materials Science Forum, Vol. 426-432 (2003), pp.2243-2248.

[7] Y. Isono and T. Tanaka: JSME Int. J. Vol. 40 (1997), pp.211-218.

[8] D. Mulliah, S. D. Kenny, R. Smith and et al: Nanotechnology, Vol. 15 (2004), pp.243-249.

[9] Y.D. Yan, T. Sun, S. Dong, X.C. Luo and Y.C. Liang: Appl. Surf. Sci., (2006).

[10] Y.X. Yao, Y. Zhu: Key Engineering Materials, Vol. 258-259 (2004), pp.180-185.

Fetching data from Crossref.
This may take some time to load.