Hydroxyapatite Formation on MOCVD-CaTiO3 Coated Ti


Article Preview

Ca-Ti-O films were prepared by MOCVD using Ca(dpm)2 and Ti(OiPr)2(dpm)2 precursors. The phases, composition and morphology of Ca-Ti-O films changed depending on the molar ratio of Ca to Ti precursors (RCa/Ti), total pressure (Ptot) and substrate temperature (Tsub). CaTiO3 films in a single phase were obtained at Tsub = 973 and 1073 K. CaTiO3 films prepared at 873 K had a dense structure and smooth surface. CaTiO3 films prepared at Tsub = 1073 K had complicated rough surface with a cauliflower-like texture. Hydroxyapatite (HAp) formed in 3 days on the CaTiO3 film prepared at Tsub = 1073 K.



Edited by:

Katsutoshi Komeya, Yohtaro Matsuo and Takashi Goto




M. Sato et al., "Hydroxyapatite Formation on MOCVD-CaTiO3 Coated Ti", Key Engineering Materials, Vol. 352, pp. 301-304, 2007

Online since:

August 2007




[1] A. Yamamoto, R. Honma and M. Sumita: J. Biomed. Mater. Res. 39 (1998) 331-340.

[2] C. X. Wang, Z. Q. Chen, L. M. Guan, M. Wang, Z. Y. Liu and P. L. Wang: Nucl. Instr. Meth. Phys. Res. Sec. B: Beam Interactions with Materials and Atoms 179 (2001) 364-372.

[3] J. L. Arias, M. B. Mayor, J. Pou, Y. Leng, B. Leon and M. Perez-Amor: Biomaterials 24 (2003) 3403-3408.

DOI: https://doi.org/10.1016/s0142-9612(03)00202-3

[4] G. Bikulius, V. Burokas, A. Martuien and E. Matulionis: Surf. Coat. Techn. 172 (2003) 139-143.

[5] H. Ming-Fa, P. Li-Hsiang and C. Tsung-Shune: Mater. Chem. Phys. 74 (2002) 245-250.

[6] L. -G. Yu, K. A. Khor, H. Li and P. Cheang: Biomaterials 24 (2003) 2695-2705.

[7] C. H. Han, C. B. Johanson, A. Wennerberg and T. Albrektsson: Clin. Oral. Impt. Res. 9 (1998) 1-10.

[8] A. Montenero, G. Gnappi, F. Ferrari and M. cesari: J. Mater. Sci. 35 (2000) 2791-2797.

[9] Y. Fujishiro, N. Sato, S. Uchida and T. Sato: J. Mater. Sci.: Mater. Med. 9 (1998) 363-367.

[10] R. Tu and T. Goto: Materials Science Forum, 475-479 (2005)1219-1222.

[11] T. Kimura and T Goto: Mater. Trans. 44(2003) 421-424.

[12] R. Tu, T. Kimura and T. Goto: Mater. Trans. 43 (2002) 2354 - 2356.

[13] R. Tu and T. Goto: Mater. Sci. Forum 475-479 (2005) 1219-1222.

[14] R. Tu and T. Goto: Mater. Trans. 46 (2005) 1318-1323.

[15] C. E. Morosanu, Thin Films by Chemical Vapor Deposition, (ELSEVIER, 1990) p.101.