Microstructure and Properties of Low Temperature Deposit CrxN Using Unbalanced Magnetron Sputtering


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CrxN coatings are deposited on the substrates with low temperature using a Teer UDP 550 Close Field Unbalanced Magnetron Sputter Ion Plating system (CFUBMSIP). The effect of applied power on Cr targets related to sample temperature is studied. When the applied power of Cr targets is lower than 1.1KW, the depositing temperature could be controlled at about 180°C. Scratch test shows no coating detachment at the end of scratch track up to 85N load. All results of Rockwell-C indentation indicate that CrxN coating holds good bonding strength. Pin-on-disc tests are performed to evaluate wear resistance of the coatings and no any wear loss can be detected after 6000s and 1800s of running. XRD profile demonstrates that the coating deposited in this study is CrxN.



Key Engineering Materials (Volumes 353-358)

Edited by:

Yu Zhou, Shan-Tung Tu and Xishan Xie




M. D. Bao et al., "Microstructure and Properties of Low Temperature Deposit CrxN Using Unbalanced Magnetron Sputtering", Key Engineering Materials, Vols. 353-358, pp. 1720-1723, 2007

Online since:

September 2007




[1] P.H. mayrhofer, G. Tischler, C. Mitterer: Surface Coatings Technology, 142-144 (2001), p.78.

[2] C. Mitterer, P.H. Mayrhofer, J. Musil: Vacuum, 71 (2003), p.279.

[3] J.J. Olaya, S.E. Rodil, S. Muhl, E. Senchez: Thin Solid Film, 474 (2005), p.119.

[4] P.H. mayrhofer, H. Willmann: C. Mitterer, Surface Coatings Technology, 146-147 (2001), p.222.

[5] Y.Y. Wang: Mechanical Engineering Materials (In Chinese), Mechanical Industry Publishing, Beijing (1991).

[6] Anthony J. Perry, Dennis G. Teer: Surface Coatings Technology, 97 (1997), p.244.

[7] J. A. Thornton: Ann Rev Mat Sci. 7 (1977), p.239.

[8] Messier R, Giri A P, Roy R A: J Vac Sci Technol. 1984, A2 (2), p.500.

[9] D.G. Teer, US Patent No. 5, 556, 519, 17th September, (1996).

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