Influence of Temperature on Characteristics of TiAl Plasma Surface Niobiumizing
In this study, plasma niobium alloying of the TiAl based alloys has been carried out at 1050, 1100 and 1150°C. The effect of the alloying temperature on the characteristic of the alloyed layer was investigated by optical microscopy, scanning electronic microscopy (SEM), glow discharge spectrum (GDS) and energy dispersive spectrum (EDS). The results show that the surface roughness, chemical composition and thickness of the alloyed layer increased with the alloying temperature which is dependent on the sheath potential. A deposition layer formed on the TiAl surface at 1150 °C was resulted from the larger sheath potential or the stronger sputtering of source electrode.
Yu Zhou, Shan-Tung Tu and Xishan Xie
X. P. Liu et al., "Influence of Temperature on Characteristics of TiAl Plasma Surface Niobiumizing ", Key Engineering Materials, Vols. 353-358, pp. 1854-1857, 2007