Electrochemical Deposition of Apatite on Titanium Substrates by Using Pulse Current
An apatite layer was successfully formed on titanium substrates by electrochemical deposition under a pulse current in a metastable calcium phosphate solution, which had 1.5 times the ion concentrations of a normal simulated body fluid, but did not contain MgCl2·6H2O, at 40 °C for 30, 60, 90 and 120 minutes at the average current density of 10 mA/cm2. The thickness of the apatite layer was increased with increasing deposition time. The pulse-current deposition produced the thicker apatite layer than the direct-current deposition, and gave some effects on the surface morphology of the apatite. The pre-treatment using acid solution gave a better adhesive between apatite and substrate. It is expected that the present electrochemical deposition under a pulse current will be useful to rapidly coat apatite on metallic materials.
Guy Daculsi and Pierre Layrolle
K. Masakazu et al., "Electrochemical Deposition of Apatite on Titanium Substrates by Using Pulse Current", Key Engineering Materials, Vols. 361-363, pp. 629-632, 2008