Electrochemical Deposition of Apatite on Titanium Substrates by Using Pulse Current


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An apatite layer was successfully formed on titanium substrates by electrochemical deposition under a pulse current in a metastable calcium phosphate solution, which had 1.5 times the ion concentrations of a normal simulated body fluid, but did not contain MgCl2·6H2O, at 40 °C for 30, 60, 90 and 120 minutes at the average current density of 10 mA/cm2. The thickness of the apatite layer was increased with increasing deposition time. The pulse-current deposition produced the thicker apatite layer than the direct-current deposition, and gave some effects on the surface morphology of the apatite. The pre-treatment using acid solution gave a better adhesive between apatite and substrate. It is expected that the present electrochemical deposition under a pulse current will be useful to rapidly coat apatite on metallic materials.



Key Engineering Materials (Volumes 361-363)

Main Theme:

Edited by:

Guy Daculsi and Pierre Layrolle






K. Masakazu et al., "Electrochemical Deposition of Apatite on Titanium Substrates by Using Pulse Current", Key Engineering Materials, Vols. 361-363, pp. 629-632, 2008

Online since:

November 2007




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