Fabrication of High Aspect Ratio Periodical Structure on Metal Using an Electroforming Process


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A procedure for fabricating a periodic structure on a metal at submicron order using holographic interferometry and molding processes is described. First, holographic interference using a He-Cd (325nm) laser is used to create the master of the periodic line structure on an i-line sub-micron positive photoresist film. A 200nm nickel thin film is then sputtered onto the positive photoresist. Pattern is then transferred to a metal using Nickel-Cobalt electroforming. Initial results show the technique can accurately control the grating’s period and depth.



Key Engineering Materials (Volumes 364-366)

Edited by:

Guo Fan JIN, Wing Bun LEE, Chi Fai CHEUNG and Suet TO




W. C. Chuang et al., "Fabrication of High Aspect Ratio Periodical Structure on Metal Using an Electroforming Process", Key Engineering Materials, Vols. 364-366, pp. 280-283, 2008

Online since:

December 2007




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