Fabrication of High Aspect Ratio Periodical Structure on Metal Using an Electroforming Process

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A procedure for fabricating a periodic structure on a metal at submicron order using holographic interferometry and molding processes is described. First, holographic interference using a He-Cd (325nm) laser is used to create the master of the periodic line structure on an i-line sub-micron positive photoresist film. A 200nm nickel thin film is then sputtered onto the positive photoresist. Pattern is then transferred to a metal using Nickel-Cobalt electroforming. Initial results show the technique can accurately control the grating’s period and depth.

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Periodical:

Key Engineering Materials (Volumes 364-366)

Edited by:

Guo Fan JIN, Wing Bun LEE, Chi Fai CHEUNG and Suet TO

Pages:

280-283

Citation:

W. C. Chuang et al., "Fabrication of High Aspect Ratio Periodical Structure on Metal Using an Electroforming Process", Key Engineering Materials, Vols. 364-366, pp. 280-283, 2008

Online since:

December 2007

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$38.00

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