Effects of the Top-Electrode Annealing on the Ferroelectric Properties of BiFeO3 Thin Films

Abstract:

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BiFeO3 films were prepared by chemical solution method on Pt/Ti/SiO2/Si substrates. The ferroelectric properties of Pt/BiFeO3/Pt capacitors were investigated, and the effect of recovery annealing applied after Pt top electrode deposition was discussed. The pure phase film with recovery annealing exhibits lower leakage current and higher remanent polarization than those without post-annealing. The leakage current is reduced by three orders of magnitude, the remanent polarization increases from 2.59μC/cm2 to 3.44μC/cm2. The recovery anneals applied after top electrode deposition may optimize the ferroelectric performance by removing the effect of structural defects formed by sputtering.

Info:

Periodical:

Key Engineering Materials (Volumes 368-372)

Edited by:

Wei Pan and Jianghong Gong

Pages:

230-231

DOI:

10.4028/www.scientific.net/KEM.368-372.230

Citation:

S. Liu et al., "Effects of the Top-Electrode Annealing on the Ferroelectric Properties of BiFeO3 Thin Films", Key Engineering Materials, Vols. 368-372, pp. 230-231, 2008

Online since:

February 2008

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$35.00

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