Effect of Annealing on Laser-Ablated K3Li2-xNb5+xO15+2x Thin Films

Abstract:

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In this study, K3Li2-xNb5+xO15+2x (KLN) thin films were prepared by laser-ablated a sintered ceramic target. For an optimum deposition condition, in-situ post annealing method was employed on as-deposited films. XRD measurements showed that KLN films with (310) preferred orientation were obtained on fused quartz substrate. Surface morphology studies indicated that in-situ post annealing could improve the surface quality of KLN thin films. The average transmittance of as-deposited and annealed films in the visible range was nearly 80% to 90%.

Info:

Periodical:

Key Engineering Materials (Volumes 368-372)

Edited by:

Wei Pan and Jianghong Gong

Pages:

302-304

DOI:

10.4028/www.scientific.net/KEM.368-372.302

Citation:

Z. S. Zhan et al., "Effect of Annealing on Laser-Ablated K3Li2-xNb5+xO15+2x Thin Films", Key Engineering Materials, Vols. 368-372, pp. 302-304, 2008

Online since:

February 2008

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Price:

$35.00

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