Ultraviolet Photoluminescence on Nano-Crystalline 6H-SiC
SiC films were prepared by HFCVD technique on (111) Si substrate. The composition and the structure of the films were investigated using EDX, XRD and transient fluorescence. Results indicated the films deposited were nanocrystalline and the calculation of the grain size gave a further confirmation. PL measurement of the present films showed that there existed a strong ultraviolet emission at room temperature.
Wei Pan and Jianghong Gong
H. Wang et al., "Ultraviolet Photoluminescence on Nano-Crystalline 6H-SiC", Key Engineering Materials, Vols. 368-372, pp. 319-321, 2008