Ultraviolet Photoluminescence on Nano-Crystalline 6H-SiC

Abstract:

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SiC films were prepared by HFCVD technique on (111) Si substrate. The composition and the structure of the films were investigated using EDX, XRD and transient fluorescence. Results indicated the films deposited were nanocrystalline and the calculation of the grain size gave a further confirmation. PL measurement of the present films showed that there existed a strong ultraviolet emission at room temperature.

Info:

Periodical:

Key Engineering Materials (Volumes 368-372)

Edited by:

Wei Pan and Jianghong Gong

Pages:

319-321

DOI:

10.4028/www.scientific.net/KEM.368-372.319

Citation:

H. Wang et al., "Ultraviolet Photoluminescence on Nano-Crystalline 6H-SiC", Key Engineering Materials, Vols. 368-372, pp. 319-321, 2008

Online since:

February 2008

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Price:

$35.00

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