Effect of Annealing Temperature on the Microstructure of Barium Strontium Titanate Films

Abstract:

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Barium strontium titanate (Ba1−xSrxTiO3, BST) films have been prepared on Pt/Ti/SiO2/Si by medium frequency (MF) magnetron sputtering, and subsequently in situ crystallized at 500-700°C. The microstructures of the MF-BST films are studied. BST films prepared by radio frequency (RF) magnetron sputtering and exhibited preferential (110) orientation, are compared. XRD shows that the MF-BST films exhibit preferential (111) orientation and better crystallization than the RF-BST films at the same annealing temperature. AFM displayed that the MF-BST films were smooth and compact. XPS analysis exhibited that the MF-BST films revealed better surface and interface structural characteristics. Their dielectric properties were also compared.

Info:

Periodical:

Key Engineering Materials (Volumes 368-372)

Edited by:

Wei Pan and Jianghong Gong

Pages:

56-58

DOI:

10.4028/www.scientific.net/KEM.368-372.56

Citation:

J. X. Liao et al., "Effect of Annealing Temperature on the Microstructure of Barium Strontium Titanate Films", Key Engineering Materials, Vols. 368-372, pp. 56-58, 2008

Online since:

February 2008

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$35.00

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