Effects of Deposition Temperature on the Growth Characteristics of CVD SiC Coatings

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The effects of deposition temperature on the growth characteristics of CVD SiC coatings were investigated. CVD SiC coatings were made by pyrolysis of methyltrichlorosilane (MTS) in hydrogen at a low pressure of 5kPa. The ratio of MTS to hydrogen was 1/12. The deposition temperatures were varied from 1373K to 1503K. Optical microscope and SEM were used to observe the surface morphology and microstructure of the coatings. XRD was used for characterization of the phase composition. Results indicated that the deposition rate and the surface roughness varied with deposition temperature. At 1373K, the deposited grains were mainly equiaxed with the crystallite size of 22 nm. However, when the deposition temperature was 1503K, the SiC grains were mainly showed faceted columnar structure with the crystallite size of 32 nm. Grain size increased with the increase of deposition temperature.

Info:

Periodical:

Key Engineering Materials (Volumes 368-372)

Edited by:

Wei Pan and Jianghong Gong

Pages:

846-848

DOI:

10.4028/www.scientific.net/KEM.368-372.846

Citation:

Y. L. Huo and Y. F. Chen, "Effects of Deposition Temperature on the Growth Characteristics of CVD SiC Coatings", Key Engineering Materials, Vols. 368-372, pp. 846-848, 2008

Online since:

February 2008

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Price:

$35.00

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