Effects of Substrate Bias Voltage on the Microstructure of Cr-Al-N Coatings


Article Preview

Cr-Al-N coatings with the thickness of about 2 μm have been prepared by a reactive magnetron sputtering method. The effects of substrate negative bias voltage (VB) on the microstructure and critical failure load have been investigated as the VB varied from 0 to –150 V. With VB increasing, grain size, lattice parameter and microstrain increase. (111) preferred orientation dominates in the coatings deposited under 0 and –50 V, while a (200) preferred orientation developed when VB further raised. The reasons for these variation caused by VB are discussed.



Key Engineering Materials (Volumes 373-374)

Main Theme:

Edited by:

M.K. Lei, X.P. Zhu, K.W. Xu and B.S. Xu




M. Zhu et al., "Effects of Substrate Bias Voltage on the Microstructure of Cr-Al-N Coatings", Key Engineering Materials, Vols. 373-374, pp. 167-171, 2008

Online since:

March 2008




[1] H. Freller and H. Haessler: Thin Solid Films, Vol. 153, (1987), p.67.

[2] A. Sue and T. P. Chang: Surf. Coat. Technol., Vol. 76-77, (1996), 61.

[3] I. Milošev, H. -H. Strehblow, and B. Navinšek: Surf. Coat. Technol., Vol. 74. (1995), pp.897-902.

[4] A. Kondo, T. Oogami, K. Sato and Y. Tanaka: Surf. Coat. Technol., Vol. 177, (2004), p.238.

[5] Y. Makino and K. Nogi: Surf. Coat. Technol., Vol. 98, (1998), p.1008.

[6] E. Huber and S. Hofmann: Surf. Coat. Technol., Vol. 68-69, (1994), p.64.

[7] J. Vetter, E. Lugscheider and S. S. Guerreiro: Surf. Coat. Technol., Vol. 98, (1998), p.1233.

[8] P. Patsalas and S. Logothetidis: J. Appl. Phys., Vol. 90, (2001), p.4725.

[9] V. N. Zhitomirsky, I. Grimberg, L. Rapoport, R. L. Boxman, N. A. Travitzky, S. Goldsmith and B. Z. Weiss: Surf. Coat. Technol., Vol. 133-134, (2000), p.114.

[10] C. Gautier, G. Moulard, J. P. Chatelon and G. Montlyl: Thin Solid Films 2001, 384, 102-108.

[11] Z. X. Song, K. W. Xu and H. Chen: Thin Solid Films, 2004, 468, 203-207.

[12] Y. Yin, D. Mckenzie and M. Bilek: Surf. Coat. Technol., 2005, 198, 156-160.

[13] G. Mah, P. S. Mcleod, and D. G. Willams: J. Vac. Sci. Technol, 1974, 11, 663-665.

[14] D. Walton: J. Chem. Phys., 1962, 37, 1671-1679.

[15] B. -Y. Shew, J. -L. Huang and D. -F. Lii: Thin Solid Films, 1997, 297, 212-219.

Fetching data from Crossref.
This may take some time to load.