Effects of Substrate Bias Voltage on the Microstructure of Cr-Al-N Coatings

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Cr-Al-N coatings with the thickness of about 2 μm have been prepared by a reactive magnetron sputtering method. The effects of substrate negative bias voltage (VB) on the microstructure and critical failure load have been investigated as the VB varied from 0 to –150 V. With VB increasing, grain size, lattice parameter and microstrain increase. (111) preferred orientation dominates in the coatings deposited under 0 and –50 V, while a (200) preferred orientation developed when VB further raised. The reasons for these variation caused by VB are discussed.

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Periodical:

Key Engineering Materials (Volumes 373-374)

Main Theme:

Edited by:

M.K. Lei, X.P. Zhu, K.W. Xu and B.S. Xu

Pages:

167-171

DOI:

10.4028/www.scientific.net/KEM.373-374.167

Citation:

M. Zhu et al., "Effects of Substrate Bias Voltage on the Microstructure of Cr-Al-N Coatings", Key Engineering Materials, Vols. 373-374, pp. 167-171, 2008

Online since:

March 2008

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$35.00

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