Effects of Substrate Bias Voltage on the Microstructure of Cr-Al-N Coatings
Cr-Al-N coatings with the thickness of about 2 μm have been prepared by a reactive magnetron sputtering method. The effects of substrate negative bias voltage (VB) on the microstructure and critical failure load have been investigated as the VB varied from 0 to –150 V. With VB increasing, grain size, lattice parameter and microstrain increase. (111) preferred orientation dominates in the coatings deposited under 0 and –50 V, while a (200) preferred orientation developed when VB further raised. The reasons for these variation caused by VB are discussed.
M.K. Lei, X.P. Zhu, K.W. Xu and B.S. Xu
M. Zhu, S. W. Duo, T. P. Li, M. S. Li, Y. C. Zhou, "Effects of Substrate Bias Voltage on the Microstructure of Cr-Al-N Coatings", Key Engineering Materials, Vols. 373-374, pp. 167-171, 2008