Effect of Low-Energy Ion Irradiation on Synthesis of Hard and Superhard Films

Abstract:

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This article summarizes briefly our recent research on low-temperature synthesis of TiN, TiN/Cu and TiN/Si films by using inductively coupled plasma assisted magnetron sputtering method. It is shown that the incorporation of high-flux low-energy ion irradiation during deposition strongly affects film growth, structure evolution, morphology and mechanical properties. A main attention is devoted to the synthesis of superhard nanocomposite films at a low deposition temperature. In both TiN/Cu and TiN/Si films the maximum hardness reaches a value higher than 40 GPa.

Info:

Periodical:

Key Engineering Materials (Volumes 373-374)

Main Theme:

Edited by:

M.K. Lei, X.P. Zhu, K.W. Xu and B.S. Xu

Pages:

172-175

DOI:

10.4028/www.scientific.net/KEM.373-374.172

Citation:

Z. G. Li et al., "Effect of Low-Energy Ion Irradiation on Synthesis of Hard and Superhard Films ", Key Engineering Materials, Vols. 373-374, pp. 172-175, 2008

Online since:

March 2008

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Price:

$35.00

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