Effect of Low-Energy Ion Irradiation on Synthesis of Hard and Superhard Films
This article summarizes briefly our recent research on low-temperature synthesis of TiN, TiN/Cu and TiN/Si films by using inductively coupled plasma assisted magnetron sputtering method. It is shown that the incorporation of high-flux low-energy ion irradiation during deposition strongly affects film growth, structure evolution, morphology and mechanical properties. A main attention is devoted to the synthesis of superhard nanocomposite films at a low deposition temperature. In both TiN/Cu and TiN/Si films the maximum hardness reaches a value higher than 40 GPa.
M.K. Lei, X.P. Zhu, K.W. Xu and B.S. Xu
Z. G. Li, S. Miyake, Y. X. Wu, "Effect of Low-Energy Ion Irradiation on Synthesis of Hard and Superhard Films ", Key Engineering Materials, Vols. 373-374, pp. 172-175, 2008