The Microstructure and Properties of CrNx Films Synthesized by Unbalanced Magnetron Sputtering

Abstract:

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CrNx film was widely used in mechanical engineering field because of its excellent anti-wear and corrosion resistance properties. While most of research was focused on mechanical properties, little attention had been paid to the corrosion resistance and residual stress of CrNx film . In this paper, CrNx films were deposited on silicon wafer (100) and iron substrate by unbalanced magnetron sputtering system (UBMS) at different N2 flow. Then the structure, thickness, residual stress, micro-hardness, wear-resistance and anti-corrosion properties of CrNx films were investigated. The results showed that the phase composition of CrNx films transformed from Cr, single phase Cr2N, Cr2N and CrN coexist to single CrN with the N2 flow rate increasing. The CrNx films composed with Cr2N phase, which deposited at 6 sccm N2 flow, had the highest microhardness and had higher compressive residual stress. Whereas the CrNx films with CrN and Cr2N phase coexist had the best wear and corrosion resistance.

Info:

Periodical:

Key Engineering Materials (Volumes 373-374)

Main Theme:

Edited by:

M.K. Lei, X.P. Zhu, K.W. Xu and B.S. Xu

Pages:

176-179

DOI:

10.4028/www.scientific.net/KEM.373-374.176

Citation:

Y. P. Wu et al., "The Microstructure and Properties of CrNx Films Synthesized by Unbalanced Magnetron Sputtering ", Key Engineering Materials, Vols. 373-374, pp. 176-179, 2008

Online since:

March 2008

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$35.00

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