Influence of Bi-Layer Thickness on the Structure and Properties of Multilayered TiN/CrN Coatings by Cathodic Arc Plasma Deposition
TiN/CrN nanoscale multilayered coatings have been deposited using cathodic arc evaporation system. The coatings were deposited using one Ti target and one Cr target with a fixed power output in the processes, whilst the bi-layer thickness was varied by rotation of the substrate holder to obtain different nanoscale multilayered period thickness. The texture structure, residual stress and nanoscale multilayer thickness of the coatings were determined by X-ray diffraction using both Bragg-Brentano and glancing angle parallel beam geometries. Hardness and adhesion strength of the coatings were measured by Vicker's and Rockwell-C indentation methods. It has been found that the structural and mechanical properties of the films were correlated with nanoscale bi-layer thickness and crystalline texture. The maximum hardness of nanolayered TiN/CrN multilayer coatings was approximately 28 GPa, which the bi-layer thickness was 4 nm.
M.K. Lei, X.P. Zhu, K.W. Xu and B.S. Xu
C. L. Chang et al., "Influence of Bi-Layer Thickness on the Structure and Properties of Multilayered TiN/CrN Coatings by Cathodic Arc Plasma Deposition", Key Engineering Materials, Vols. 373-374, pp. 192-195, 2008