PVD-PECVD Hybrid Processes: Synthesis of Composite Thin Films and Process Understanding

Abstract:

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After reviewing most of the recent developments performed on hybrid processes, basic physical phenomena of PVD-PECVD processes are detailed with the help of a model showing the different influences of main process parameters. Ti-Si-O and Zn-Si-O thin films are synthesized as possible examples of composite thin films. Limitations of the model developed are also discussed with respect to the composition and structure of deposited thin films.

Info:

Periodical:

Key Engineering Materials (Volumes 373-374)

Main Theme:

Edited by:

M.K. Lei, X.P. Zhu, K.W. Xu and B.S. Xu

Pages:

93-99

DOI:

10.4028/www.scientific.net/KEM.373-374.93

Citation:

T. Belmonte et al., "PVD-PECVD Hybrid Processes: Synthesis of Composite Thin Films and Process Understanding", Key Engineering Materials, Vols. 373-374, pp. 93-99, 2008

Online since:

March 2008

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Price:

$35.00

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