PVD-PECVD Hybrid Processes: Synthesis of Composite Thin Films and Process Understanding

Abstract:

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After reviewing most of the recent developments performed on hybrid processes, basic physical phenomena of PVD-PECVD processes are detailed with the help of a model showing the different influences of main process parameters. Ti-Si-O and Zn-Si-O thin films are synthesized as possible examples of composite thin films. Limitations of the model developed are also discussed with respect to the composition and structure of deposited thin films.

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Periodical:

Key Engineering Materials (Volumes 373-374)

Main Theme:

Edited by:

M.K. Lei, X.P. Zhu, K.W. Xu and B.S. Xu

Pages:

93-99

DOI:

10.4028/www.scientific.net/KEM.373-374.93

Citation:

T. Belmonte et al., "PVD-PECVD Hybrid Processes: Synthesis of Composite Thin Films and Process Understanding", Key Engineering Materials, Vols. 373-374, pp. 93-99, 2008

Online since:

March 2008

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Price:

$35.00

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