Electrophoretic Deposition: Fundamentals and Applications IV

Volume 507

doi: 10.4028/www.scientific.net/KEM.507

Info:

Electrophoretic Deposition: Fundamentals and Applications IV
ISBN-13:
978-3-03785-379-5
Authors / Editors:
A. R. Boccaccini, O. Van der Biest, R. Clasen and J.H. Dickerson
Pages:
260
Year:
2012
Edition:
softcover

Description:

Volume is indexed by Thomson Reuters CPCI-S (WoS).
The contributions to this special collection cover a wide range of subject areas related to EPD and reflect the impressive versatility of that technique for materials processing. The topics discussed range from theoretical studies of the fundamental mechanisms of EPD, to novel techniques which exploit EPD for the efficient and cost-effective fabrication of a variety of advanced materials.



Review from Ringgold Inc., ProtoView: The 37 papers cover advanced experimental techniques and theoretical approaches to electrophoretic deposition; nanostructured materials, carbon nanotubes, and thin films; biomaterials and biological entities; electrophoretic deposition integrated manufacturing technologies, and electrophoretic deposition in ceramic processing. Among the specific topics are pulse electric fields for electrophoretic deposition of thermal barrier coatings, electrophoretic deposition onto ionic liquid layers, cadmium sulfide and zinc sulfide nanostructures formed by electrophoretic deposition, electrophoretic deposition of phosphors for display and solid state lighting technologies, and characterizing ceramic powder surface by contact angle measurements and infrared spectroscopy.

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