Preparation of Fe(Pt,Pd) Alloy Thin Films with Flat Surfaces on MgO(001) Single-Crystal Substrates
Fe50(Pt1–xPdx)50 (at. %, x = 0, 0.25, 0.5, 0.75, 1) alloy thin films are prepared on MgO(001) substrates by using two methods, high-temperature deposition at 600 °C (one-step method) and low-temperature deposition at 200 °C followed by annealing at 600 °C (two-step method). The influence of formation method on the film structure is investigated. L10 crystals epitaxially grow on the substrates when films are deposited at 600 °C. Disordered crystals transform into L10 structure when films are annealed at 600 °C. The films with x > 0.5 consist of L10(001) crystals with the c-axis normal to the substrate surface, whereas the films with x < 0.25 involve small volumes of L10(100) crystals with the c-axis lying in the film plane. Similar final crystallographic orientation is realized for the Fe (Pt,Pd) films prepared by employing the two different methods. The films prepared by one-step method possess island-like surfaces involving side facets, while those prepared by two-step method have very flat surfaces with the arithmetical mean roughness lower than 0.2 nm. The two-step method is effective for preparation of Fe (Pt,Pd) films with flat surfaces.
J. Gutierez, J.M. Barandiarán, Evangelos Hristoforou and Dr. Dimitros S. Vlachos
M. Ohtake et al., "Preparation of Fe(Pt,Pd) Alloy Thin Films with Flat Surfaces on MgO(001) Single-Crystal Substrates", Key Engineering Materials, Vol. 644, pp. 227-231, 2015