Optical Absorption Peculiarities of Al-Si-N Coatings Produced by Magnetron Sputtering

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In this paper the optical absorption characteristics of Al–Si–N coatings, deposited by magnetron sputtering on the substrates from silicon single crystals and glass were studied. The influence of conditions deposition on optical properties has been determined. The characteristics of interband and exponential absorption are determined by influence of localized states (LS) of defects continuously distributed in the band gap (BG) and reflect the influence on properties of crystalline and amorphous components material of coatings. The interband absorption is realized via the allowed indirect transitions through the optical gap 2.7–2.8 eV and direct transitions through the gap 3.8–3.96 eV. The interrelations between the parameters of interband and exponential absorption are typical for the naterials, whose properties are determined by a static and/or dynamic disordering of the crystal lattice by the defects of a different nature. Maximal average value of the BG width is 4.8–5.1 eV in the scope of semiclassical analysis applied to amorphous and strongly defective materials. The optical parameters of deposited coatings are changed in correlation with a changing of the mechanical characteristics in dependency on the nitrogen pressure.

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Edited by:

Georgiy Osokin, Gennady E. Remnev, Valeriy Pogrebenkov, Sergey Psakhie, Nikolay Ratakhin

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3-8

Citation:

A. V. Kabyshev et al., "Optical Absorption Peculiarities of Al-Si-N Coatings Produced by Magnetron Sputtering", Key Engineering Materials, Vol. 712, pp. 3-8, 2016

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September 2016

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