Silicides Thin Films Formed by Metal/Silicon Reaction: Role of Diffusion

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Periodical:

Materials Science Forum (Volumes 155-156)

Edited by:

Y. Limoge and J.L. Bocquet

Pages:

39-54

DOI:

10.4028/www.scientific.net/MSF.155-156.39

Citation:

P. Gas "Silicides Thin Films Formed by Metal/Silicon Reaction: Role of Diffusion ", Materials Science Forum, Vols. 155-156, pp. 39-54, 1994

Online since:

May 1994

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$35.00

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