Materials Science Applications of Ion Beam Techniques
The first particle accelerators were built in the early 1930’s. For a long time, these devices were used exclusively by nuclear physicists. In the 1960’s, extensive developments in measuring techniques occurred, mainly as a result of newly developed semiconductor devices. Further strong interest arose from the semiconductor industry, and ion implantation became widely accepted as being the ultimate tool for Si-based device fabrication.
During the past decade, extensive experimentation on the use of ion beam techniques has made the dream reality, and the modification of structures and properties, as well as analysis of the modified surfaces, is widely used today in a wide rage of fields. They include amorphisation-recrystallisation studies, investigation of adhesion, hardness, wear resistance, corrosion, etc., modification of interface properties by ion beam mixing, fabrication of semiconductor devices by low and high energy ion implantation, etc.
The concept of modern materials science without the application of ion beam techniques is now inconceivable, and this volume highlights the newest technologically important applications and developments of these methods.
1. Basic Processes. 2. Ion Beam Modification of Materials. 3. Ion Beam Analysis. 4. New Technical Developments. 5. Industrial Applications.