Correlation between Deposition Rate and Hardness of Remote PECVD Silicon Oxide Films

Abstract:

Article Preview

Info:

Periodical:

Materials Science Forum (Volumes 287-288)

Edited by:

Horst Hoffmann

Pages:

389-392

DOI:

10.4028/www.scientific.net/MSF.287-288.389

Citation:

C. Bayer and P. R. von Rohr, "Correlation between Deposition Rate and Hardness of Remote PECVD Silicon Oxide Films", Materials Science Forum, Vols. 287-288, pp. 389-392, 1998

Online since:

August 1998

Export:

Price:

$35.00

In order to see related information, you need to Login.