Low-Frequency Noise Measurements as a Quality Indicator for Ohmic Contacts to n-GaN

Abstract:

Article Preview

Info:

Periodical:

Materials Science Forum (Volumes 433-436)

Edited by:

Peder Bergman and Erik Janzén

Pages:

677-680

DOI:

10.4028/www.scientific.net/MSF.433-436.677

Citation:

N. Tanuma et al., "Low-Frequency Noise Measurements as a Quality Indicator for Ohmic Contacts to n-GaN", Materials Science Forum, Vols. 433-436, pp. 677-680, 2003

Online since:

September 2003

Export:

Price:

$35.00

In order to see related information, you need to Login.

In order to see related information, you need to Login.