Comparative Study of Porosity in Low-k SiOCH Thin Films Obtained at Different Deposition Conditions

Abstract:

Article Preview

Info:

Periodical:

Materials Science Forum (Volumes 445-446)

Edited by:

Toshio Hyodo, Yoshinori Kobayashi, Yasuyuki Nagashima, Haruo Saito

Pages:

268-270

DOI:

10.4028/www.scientific.net/MSF.445-446.268

Citation:

R. S. Brusa et al., "Comparative Study of Porosity in Low-k SiOCH Thin Films Obtained at Different Deposition Conditions", Materials Science Forum, Vols. 445-446, pp. 268-270, 2004

Online since:

January 2004

Export:

Price:

$35.00

In order to see related information, you need to Login.

In order to see related information, you need to Login.