Comparative Study of Porosity in Low-k SiOCH Thin Films Obtained at Different Deposition Conditions

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Periodical:

Materials Science Forum (Volumes 445-446)

Edited by:

Toshio Hyodo, Yoshinori Kobayashi, Yasuyuki Nagashima, Haruo Saito

Pages:

268-270

Citation:

R. S. Brusa et al., "Comparative Study of Porosity in Low-k SiOCH Thin Films Obtained at Different Deposition Conditions", Materials Science Forum, Vols. 445-446, pp. 268-270, 2004

Online since:

January 2004

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DOI: https://doi.org/10.1063/1.1627956

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