Structure Dependent Oxidation of Al Thin Films for MTJ Tunnel Barrier

Abstract:

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Magnetic tunnel junctions(MTJ) are fabricated as a function of the input power of Al thin film. Al thin films have pseudo-crystalline structure at 30, 60, 90 W and transform into amorphous like smooth nanocrystalline state at 120 W. Junction resistance increases as the annealing temperature increases up to 250 􀀀 and decrease at 300 􀀀 at the pseudo-crystalline barrier. When the barrier has amorphous like nanocrystalline structure, optimum annealing temperature increases up to 300 􀀀 . The barrier characteristics are strongly related with the microstructure of AlOx barrier.

Info:

Periodical:

Materials Science Forum (Volumes 449-452)

Edited by:

S.-G. Kang and T. Kobayashi

Pages:

1053-1056

DOI:

10.4028/www.scientific.net/MSF.449-452.1053

Citation:

Y.W. Lee et al., "Structure Dependent Oxidation of Al Thin Films for MTJ Tunnel Barrier", Materials Science Forum, Vols. 449-452, pp. 1053-1056, 2004

Online since:

March 2004

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Price:

$35.00

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