Effect of Growth Condition on the Electrical and Magnetic Properties of Sputtered ZnCo2O4 Films

Abstract:

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We report on the effect of the oxygen partial pressure ratio in the sputtering gas mixture on the electrical and magnetic properties of cubic spinel ZnCo2O4 thin films grown by reactive magnetron sputtering. The conduction type and carrier concentration in ZnCo2O4 films were found to be dependent on the oxygen partial pressure ratio. The maximum electron and hole concentration at 300 K were estimated to be as high as 1.37 × 1020 cm-3 and 2.81 × 1020 cm-3, respectively. While an antiferromagnetic coupling was found for n-type ZnCo2O4, a ferromagnetic interaction was observable in p-type ZnCo2O4, indicating hole-induced ferromagnetic transition in spinel ZnCo2O4.

Info:

Periodical:

Materials Science Forum (Volumes 449-452)

Edited by:

S.-G. Kang and T. Kobayashi

Pages:

509-512

DOI:

10.4028/www.scientific.net/MSF.449-452.509

Citation:

H. J. Kim et al., "Effect of Growth Condition on the Electrical and Magnetic Properties of Sputtered ZnCo2O4 Films", Materials Science Forum, Vols. 449-452, pp. 509-512, 2004

Online since:

March 2004

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$35.00

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