The process of Direct Bonding Copper (DBC) is performed by a spinel reaction between CuO and Al2O3. In order to develop DBC on alumina substrate with high bonding strength, alumina substrate was preformed as follows: Cu was sputter-deposited on alumina substrate. Sputter-Deposited Cu (SDC) on alumina substrate was oxidized at 673K for 30min in air atmosphere and then stabilized at 1273K for 30min in N2 gas atmosphere to improve bonding strtrength between preformed alumina substrate and SDC layer. Subsequently, the Cu-foil (300µm) was bonded on preformed-alumina substrate in N2 gas atmosphere at 1342~1345K. It was found that optimum condition of DBC on preformed-alumina substrate could be successfully obtained at 1345K for 30min. Consequently, bonding strength of DBC on alumina substrate was the high value of 80N/cm. Observation and analysis of microstructure for Cu sputtered DBC showed that reaction compounds such as CuAlO2 and CuAl2O4 approved to be formed in the vicinity of interface between Cu and alumina substrate.