Electrical/Optical Properties of Thin Transparent Oxide Films Deposited Using DC Magnetron Sputtering

Abstract:

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Amorphous indium tin oxide (ITO) thin films were grown on plastic substrates, PES (polyethersulfone) using low temperature DC magnetron sputtering. Various post-annealing techniques are attempted to optimize conductivity, transmittance, and roughness: i) conventional thermal annealing, ii) excimer laser annealing, and iii) UV irradiation. The electrical/optical properties were measured using Hall-measurement, DC 4-point resistance measurement, and UV spectrometry along with micro-structural characterization. Optimized UV treatment exhibits enhanced conductivity and smooth surface, compared to those of conventional thermal annealing and excimer laser annealing.

Info:

Periodical:

Materials Science Forum (Volumes 449-452)

Edited by:

S.-G. Kang and T. Kobayashi

Pages:

989-992

DOI:

10.4028/www.scientific.net/MSF.449-452.989

Citation:

B. S. So et al., "Electrical/Optical Properties of Thin Transparent Oxide Films Deposited Using DC Magnetron Sputtering", Materials Science Forum, Vols. 449-452, pp. 989-992, 2004

Online since:

March 2004

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Price:

$35.00

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