Deposition of SiO2 and SiO2:Ge Films for Optical Applications in a Matrix Distributed Electron Cyclotron Resonance Reactor

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Periodical:

Materials Science Forum (Volumes 455-456)

Edited by:

Rodrigo Martins, Elvira Fortunator, Isabel Ferreira, Carlos Dias

Pages:

25-29

DOI:

10.4028/www.scientific.net/MSF.455-456.25

Citation:

D. Daineka et al., "Deposition of SiO2 and SiO2:Ge Films for Optical Applications in a Matrix Distributed Electron Cyclotron Resonance Reactor", Materials Science Forum, Vols. 455-456, pp. 25-29, 2004

Online since:

May 2004

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$35.00

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